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P227-4/P227-4F Polishing Compound
P227-4/P227-4F Polishing Compound Automotive Buffing Compound Our products provide reliable solutions for polishing automotive metal exterior trim, achieving a pass rate of over 95% for components such as roof rails, trim moldings, beltline moldings, wheels, and exhaust tips. Key Features: Non...
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P211 Polishing Compound
P211 Polishing Compound P211 Baolishi Rough Polishing Paste for Cast Copper Faucets · Primary Function: Quickly eliminates sandpaper marks on cast copper parts. · Key Features: · Non-separating formula · Excellent cutting ability · High-gloss result · Easy to clean
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G-12 Polishing Compound
G-12 Polishing Compound Polishi G-12 Polishing Compound Alloy Wheel Mirror Polishing Compound Formulated with premium imported abrasives and Polishi's proprietary technology, it delivers excellent cutting performance, uniform particle size, and rapid gloss enhancement. Specifically designed for ...
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Polyurethane Polishing Pad - Red Pad
Polyurethane Polishing Pad - Red Pad The Workhorse for Coarse Polishing Polyurethane Polishing Pad - Red Pad The Workhorse for Coarse Polishing · Polyurethane Pad (Red) – The Powerhouse of Rough Grinding · Red Polyurethane Pad: Your Engine for Efficient Coarse Polishing
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Conditioned Fabric Pad (Black) – The Final Step to Flawless Surfaces
Conditioned Fabric Pad (Black) – The Final Step to Flawless Surfaces CMP Damped Fabric Polishing Pad: For Ultimate Surface Perfection · Role: A key consumable in CMP for precision materials (semiconductor chips, optical glass). · How It Works: Achieves planarization by combining physical friction ...
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White Non-Woven Pad: The Versatile Mid-Stage Solution
White Non-Woven Pad: The Versatile Mid-Stage Solution POLISHER CMP White Pad: Precision from Coarse to Fine · Role: A key consumable for wafer planarization in CMP processes. · Material Tech: Specially treated non-woven base for high absorbency & uniform material removal. · Best For: Sapphire, ...
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Chemical Mechanical Planarization (CMP)
Chemical Mechanical Planarization (CMP) is a process that combines chemical corrosion and mechanical grinding, primarily used for nanoscale planarization of wafer surfaces in 3C electronics and semiconductor manufacturing. Baolishi CMP Polishing Pads are specifically engineered for CMP processes on ...
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SF-1500 Fine Polishing Liquid
SF-1500 Fine Polishing Liquid Formulated with imported abrasives and additives, it offers excellent dispersion and wettability for rapid gloss development, high-gloss finish, and easy cleanup. Ideal for mirror polishing of acrylic, plastic, automotive lenses, and similar materials. Application: ...
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A33 Plastic Rough Polishing Liquid
A33 Plastic Rough Polishing Liquid Formulated with imported abrasives for superior dispersion and strong cutting. Delivers a fast, easy-to-clean mirror finish on acrylic, plastic, and headlights.
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Sanding Blocks
Sanding Blocks · Unique Pyramid Pattern - ensures consistent abrasion · Even Sanding - uniform finish across the surface · Long Service Life - enhanced durability.
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Diamond Grinding Sticks Diamond Abrasive Belts
Diamond Grinding Sticks Diamond Abrasive Belts Construction: High-strength polyester film substrate with uniformly distributed premium diamond grains. Performance: Exceptional cutting force and superior heat dissipation. Applications: · Precision molds · Hard alloys · Ceramic materials Capability: ...
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Sponge Sanding Blocks
Sponge Sanding Blocks · Structure: Unique cushioning design with high-density foam · Key Advantages: · Excellent Conformability · Good Wear Resistance · Uniform Sanding Finish · Application: Ideal for contour sanding · Usage: Suitable for both dry & wet use
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