Baolishi Grinding Technology (Changzhou) Co., Ltd. Products Online

P227-4/P227-4F Polishing Compound Automotive Buffing Compound Our products provide reliable solutions for polishing automotive metal exterior trim, achieving a pass rate of over 95% for components such as roof rails, trim moldings, beltline moldings, wheels, and exhaust tips. Key Features: Non-delaminating: Ensures structural integrity. High Cutting Efficiency: For fast material removal. Superior Finish: Delivers a high-gloss surface. Easy Clean-up: Saves time and effort.

P211 Polishing Compound P211 Baolishi Rough Polishing Paste for Cast Copper Faucets · Primary Function: Quickly eliminates sandpaper marks on cast copper parts. · Key Features: · Non-separating formula · Excellent cutting ability · High-gloss result · Easy to clean

G-12 Polishing Compound Polishi G-12 Polishing Compound Alloy Wheel Mirror Polishing Compound Formulated with premium imported abrasives and Polishi's proprietary technology, it delivers excellent cutting performance, uniform particle size, and rapid gloss enhancement. Specifically designed for mirror finishing on aluminum alloy and stainless steel wheels.

Polyurethane Polishing Pad - Red Pad The Workhorse for Coarse Polishing Polyurethane Polishing Pad - Red Pad The Workhorse for Coarse Polishing · Polyurethane Pad (Red) – The Powerhouse of Rough Grinding · Red Polyurethane Pad: Your Engine for Efficient Coarse Polishing

Conditioned Fabric Pad (Black) – The Final Step to Flawless Surfaces CMP Damped Fabric Polishing Pad: For Ultimate Surface Perfection · Role: A key consumable in CMP for precision materials (semiconductor chips, optical glass). · How It Works: Achieves planarization by combining physical friction with chemical action. · Material: Typically constructed from polymers like polyurethane. · Performance Drivers: Key parameters (hardness, density, pore size, elasticity) directly

White Non-Woven Pad: The Versatile Mid-Stage Solution POLISHER CMP White Pad: Precision from Coarse to Fine · Role: A key consumable for wafer planarization in CMP processes. · Material Tech: Specially treated non-woven base for high absorbency & uniform material removal. · Best For: Sapphire, silicon wafers, and copper layers (coarse to fine polishing). · Direct Replacement: Fully compatible alternative to SUBA 600/800 series pads. · Versatility: Meets precision finishing

Chemical Mechanical Planarization (CMP) is a process that combines chemical corrosion and mechanical grinding, primarily used for nanoscale planarization of wafer surfaces in 3C electronics and semiconductor manufacturing. Baolishi CMP Polishing Pads are specifically engineered for CMP processes on materials like sapphire and silicon wafers. The product line includes three main categories: · Polyurethane Red Pads: For coarse polishing. · Non-Woven White Pads: For intermediate

SF-1500 Fine Polishing Liquid Formulated with imported abrasives and additives, it offers excellent dispersion and wettability for rapid gloss development, high-gloss finish, and easy cleanup. Ideal for mirror polishing of acrylic, plastic, automotive lenses, and similar materials. Application: Compatible with cotton buffs, wool pads, and foam pads. Certification: Compliant with both RoHS and REACH environmental standards.

A33 Plastic Rough Polishing Liquid Formulated with imported abrasives for superior dispersion and strong cutting. Delivers a fast, easy-to-clean mirror finish on acrylic, plastic, and headlights.

Sanding Blocks · Unique Pyramid Pattern - ensures consistent abrasion · Even Sanding - uniform finish across the surface · Long Service Life - enhanced durability.

Diamond Grinding Sticks Diamond Abrasive Belts Construction: High-strength polyester film substrate with uniformly distributed premium diamond grains. Performance: Exceptional cutting force and superior heat dissipation. Applications: · Precision molds · Hard alloys · Ceramic materials Capability: Achieves a mirror finish via efficient grinding and polishing. Operation & Benefits: · Suitable for dry & wet use. · Coolant use recommended for maximum belt life. · Minimizes dust,

Sponge Sanding Blocks · Structure: Unique cushioning design with high-density foam · Key Advantages: · Excellent Conformability · Good Wear Resistance · Uniform Sanding Finish · Application: Ideal for contour sanding · Usage: Suitable for both dry & wet use