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  • Qualité P211 Composé de polissage usine

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    P211 Composé de polissage

    P211 Polishing Compound P211 Baolishi Rough Polishing Paste for Cast Copper Faucets · Primary Function: Quickly eliminates sandpaper marks on cast copper parts. · Key Features: · Non-separating formula · Excellent cutting ability · High-gloss result · Easy to clean

  • Qualité Tampon de polissage en polyuréthane - Tampon rouge usine

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    Tampon de polissage en polyuréthane - Tampon rouge

    Polyurethane Polishing Pad - Red Pad The Workhorse for Coarse Polishing Polyurethane Polishing Pad - Red Pad The Workhorse for Coarse Polishing · Polyurethane Pad (Red) – The Powerhouse of Rough Grinding · Red Polyurethane Pad: Your Engine for Efficient Coarse Polishing

  • Qualité Composé de polissage G-12 usine

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    Composé de polissage G-12

    G-12 Polishing Compound Polishi G-12 Polishing Compound Alloy Wheel Mirror Polishing Compound Formulated with premium imported abrasives and Polishi's proprietary technology, it delivers excellent cutting performance, uniform particle size, and rapid gloss enhancement. Specifically designed for mirror finishing on aluminum alloy and stainless steel wheels.

  • Qualité Le tampon blanc non tissé: une solution polyvalente pour la phase intermédiaire usine

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    Le tampon blanc non tissé: une solution polyvalente pour la phase intermédiaire

    White Non-Woven Pad: The Versatile Mid-Stage Solution POLISHER CMP White Pad: Precision from Coarse to Fine · Role: A key consumable for wafer planarization in CMP processes. · Material Tech: Specially treated non-woven base for high absorbency & uniform material removal. · Best For: Sapphire, silicon wafers, and copper layers (coarse to fine polishing). · Direct Replacement: Fully compatible alternative to SUBA 600/800 series pads. · Versatility: Meets precision finishing

  • Qualité La dernière étape vers des surfaces parfaites usine

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    La dernière étape vers des surfaces parfaites

    Conditioned Fabric Pad (Black) – The Final Step to Flawless Surfaces CMP Damped Fabric Polishing Pad: For Ultimate Surface Perfection · Role: A key consumable in CMP for precision materials (semiconductor chips, optical glass). · How It Works: Achieves planarization by combining physical friction with chemical action. · Material: Typically constructed from polymers like polyurethane. · Performance Drivers: Key parameters (hardness, density, pore size, elasticity) directly

  • Qualité Planarisation mécanique chimique (CMP) usine

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    Planarisation mécanique chimique (CMP)

    Chemical Mechanical Planarization (CMP) is a process that combines chemical corrosion and mechanical grinding, primarily used for nanoscale planarization of wafer surfaces in 3C electronics and semiconductor manufacturing. Baolishi CMP Polishing Pads are specifically engineered for CMP processes on materials like sapphire and silicon wafers. The product line includes three main categories: · Polyurethane Red Pads: For coarse polishing. · Non-Woven White Pads: For intermediate

  • Qualité Blocs de ponçage usine

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    Blocs de ponçage

    Sanding Blocks · Unique Pyramid Pattern - ensures consistent abrasion · Even Sanding - uniform finish across the surface · Long Service Life - enhanced durability.

  • Qualité Bâtons de meulage diamantés Courroies abrasives diamantées usine

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    Bâtons de meulage diamantés Courroies abrasives diamantées

    Diamond Grinding Sticks Diamond Abrasive Belts Construction: High-strength polyester film substrate with uniformly distributed premium diamond grains. Performance: Exceptional cutting force and superior heat dissipation. Applications: · Precision molds · Hard alloys · Ceramic materials Capability: Achieves a mirror finish via efficient grinding and polishing. Operation & Benefits: · Suitable for dry & wet use. · Coolant use recommended for maximum belt life. · Minimizes dust,

  • Qualité Blocs de ponçage éponge usine

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    Blocs de ponçage éponge

    Sponge Sanding Blocks · Structure: Unique cushioning design with high-density foam · Key Advantages: · Excellent Conformability · Good Wear Resistance · Uniform Sanding Finish · Application: Ideal for contour sanding · Usage: Suitable for both dry & wet use

  • Qualité P229-3-11 Cire à polir usine

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    P229-3-11 Cire à polir

    P229-3-11 Polishing Wax · Description: An upgraded medium-coarse polishing wax from Baolishi, designed to match the performance of GW16 Polishing Wax. · Applications: Ideal for surfaces like painted finish, acrylic, phenolic resin, and more. · Features: · Excellent cutting power · Scratch-free finish · Non-sticky residue · Fast gloss development

  • Qualité P08 Cire haute brillance usine

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    P08 Cire haute brillance

    P08 High-Gloss Wax · Technology: Imported greases & customized Baolishi abrasives. · Application: Precision polishing of titanium alloy, stainless steel, and similar surfaces. · Key Advantages: · Powerful Cutting Force · Rapid Mirror Finish · Effectively Prevents Pitting on Titanium Alloy

  • Qualité D-36 cire de polissage usine

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    D-36 cire de polissage

    D-36 Polishing Wax · Core Feature: Uses Japanese-identical formulation for premium performance. · Positioning: A direct and complete substitute for expensive imported polishing wax. · Application: Fine polishing of titanium alloy, stainless steel, gold, and silver jewelry. · Recommended Use: Pairs best with Baolishi's designated buffing wheels. · Ideal For: High-end watchbands & cases, precision molds, eyewear frames. · Key Benefits: · Strong cutting power · Moderate oil